MIRROR FACE FINISHING OF ALUMINUM ALLOY SUBSTRATE

PURPOSE:To obtain an aluminum alloy substrate with a high reflection coefficient and no defective surface by using a specific colloidal silica solution as an abrasive. CONSTITUTION:A colloidal silica solution adjusted to pH of 8 or below by organic acid (e.g., lactic acid, gluconic acid, formic acid...

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Bibliographische Detailangaben
Hauptverfasser:	USUI HIDEYOSHI, SATO MOTOHARU
Format:	Patent
Sprache:	eng
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain an aluminum alloy substrate with a high reflection coefficient and no defective surface by using a specific colloidal silica solution as an abrasive. CONSTITUTION:A colloidal silica solution adjusted to pH of 8 or below by organic acid (e.g., lactic acid, gluconic acid, formic acid) is used as an abrasive, one face or both faces of an aluminum alloy substrate are concurrently polish- machined. When such abrasive is used, the surface of the aluminum alloy substrate can be finish-machined with low noise to the surface having a very high reflection coefficient and no scratch. The organic acid has a good cleaning property, the surface of aluminum alloy needs only to be lightly cleaned at the time of cleaning, the occurrence of scratches can be extremely reduced. The organic acid near the neutrality is used, and problems of a waste liquid or the like are not generated.