JPH0123948B

PURPOSE:To improve the yield rate of manufacturing processes, by depositing a CdS film on an insulating substrate, forming an optical sensor element shape, depositing CdSe on the insulating substrate including the optical sensor element, performing annealing in the atmosphere of Cl or a Cl compound, and thereafter forming a wiring group. CONSTITUTION:A CdS film 2 is deposited on an insulating substrate 1 from the alkali solution of Cd salt. A photoresist 3 is formed in the same shape as the desired pattern of the CdS film. The unnecessary part of the CdS film 2 is dessolved. The photoresist 3 is further dissolved and removed by aceton and the like. The insulating substrate, on the surface of which the desired CdS film is formed, is obtained. A CdSe film 4 is deposited on the surface of the insulating substrate 1, on which the CdS film 2 is formed on the desired shape. The insulating substrate, on which the CdS film and the CdSe film are deposited, is annealed in the atmosphere including Cl or a Cl compound, e.g., in the N2 atmosphere including CdCl2. Then the CdSe film 2 on the CdS film 2 be comes a solid solution film, i.e., an optical sensor 5, by mutual diffusion. A metal layer such an Ni-Cr alloy and Au layers is deposited on the insulating substrate 1, on which the optical sensor element 5 is formed. A wiring group 6 is formed, and an optical sensor array is manufactured.