PHOTOMASK

PURPOSE:To prevent damaging of the photomask surface and to enable dealing with various kinds of masks by disposing a polarizing plate on a smectic A liquid crystal display panel incorporated with a liquid crystal compsn. which is added with a black dye and exhibits a smectic A phase and forming pho...

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1. Verfasser: HIBINO SHINICHI
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To prevent damaging of the photomask surface and to enable dealing with various kinds of masks by disposing a polarizing plate on a smectic A liquid crystal display panel incorporated with a liquid crystal compsn. which is added with a black dye and exhibits a smectic A phase and forming photopatterns by irradiation and scanning of laser light or voltage impression. CONSTITUTION:Org. oriented films 2, 2 are formed on hard substrates 1, 1 and the surfaces thereof are subjected to a parallel arrangement treatment by a polishing fabric. The smectic A liquid crystal 4 added with the black dye is put into the cell. The polarizing plate 5 is disposed to such smectic A liquid crystal panel. The dye which senses the laser light is incorporated into the liquid crystal of the smectic A. Such liquid crystal absorbs the optical heat of the laser light and the temp. thereof rises to the smectic A-isotropic transition point or above when the liquid crystal is subjected to laser scanning. The arrangement goes into disorder and the irradiated part becomes bright at the time of rapid heating and cooling. The patterns are formed when the laser light is scanned. The damaging of the surfaces is thereby prevented and the dealing with various kinds of the masks is enabled.