LIQUID PHASE EPITAXIAL GROWTH BOAT
PURPOSE:To grow a film in which the in-plane uniformity of film thickness is excellent on a substrate and to improve the characteristics and yield of a semiconductor element by forming the shape in the lower part of the wall surface of a soln. reservoir for a soln. holder into the same shape as the...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE:To grow a film in which the in-plane uniformity of film thickness is excellent on a substrate and to improve the characteristics and yield of a semiconductor element by forming the shape in the lower part of the wall surface of a soln. reservoir for a soln. holder into the same shape as the shape of a raw material soln. at the time of epitaxial growth. CONSTITUTION:A liquid phase epitaxial growth boat is constituted so that the shapes in the lower parts of the wall surfaces of the soln. reservoirs 12 for a soln. holder 11 are formed into the same shape as the shape of a raw material soln. 8 at a time of epitaxial growth, namely, the shapes rounded in the corners. Epitaxial growth is performed by regulating the boat to the epitaxial growth starting temp. and sliding a substrate 5 under the soln. reservoir 12 of the soln. holder 11 introduced with the raw material soln. 8 molted at the required temp. with a quartz rod 7. At this time, the whole surface of the substrate 5 can be brought into contact with the soln. 8 in the same state as it and the grown film having uniform thickness in a range over the whole surface of the substrate 5 can be obtained. |
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