PATTERN FORMING MATERIAL

PURPOSE:To obtain the title material effective in the minute working of a substrate having especially stage difference, and having the durability against the RIE of an oxygen gas by incorporating a polymer having a specified structural unit and a quinone diazide compd. in said material. CONSTITUTION...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YAMADA TAKAMASA, OIE MASAYUKI, KAMIYA SHIGEMITSU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS
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