PATTERN FORMING MATERIAL

PURPOSE:To obtain the title material effective in the minute working of a substrate having especially stage difference, and having the durability against the RIE of an oxygen gas by incorporating a polymer having a specified structural unit and a quinone diazide compd. in said material. CONSTITUTION:The pattern forming material contains the polymer having the structural unit shown by formula I and II, and the quinone diazide compd. In formula I, R is hydrogen atom or alkyl group, R and R are each hydrogen atom or alkyl group, etc. In formula II, R -R are each alkyl or alkylsiloxy group, and at least one of groups R -R is alkylsiloxy group, (n) is 0-4. Monomers capable of giving the structural units shown by formulas I and II are exemplified by o-hydroxystyrene or trimethylsiloxy dimethylsilyl methacrylate, etc. The usable polymer is selected from the group comprising the copolymer of the monomers shown by formulas I and II or the copolymer of said monomers and a monomer capable of copolymerizing with said monomers. Thus, the pattern forming material effective in the minute working of the substrate having the stage difference, and having the excellent durability against the RIE of the oxygen gas, is obtd.