ELECTRON BEAM LITHOGRAPHY EQUIPMENT

PURPOSE:To provide an electron beam lithography equipment having an accurate XY table at a high speed by directly driving the table by a linear DC motor, and magnetically shielding it with a magnetic shielding material utilizing the Meissner effect of a superconducting material so as not to impart the influence of the magnetic field of the motor to an electron beam. CONSTITUTION:An XY table has a superposing structure of an X table 20a and a Y table 20b movable in directions perpendicular to each other in a plane. Driving mechanisms have linear DC motors 28a, 28b disposed at the lower sides of the centroids of the respective tables for driving the tables in directions X and Y as directly driving mechanisms for transmitting the thrusts of the motors directly to the tables without intermediary of transmitting mechanisms. The magnetically shielding materials have a magnetic shielding material A; 29a mounted on a wider surface than the lithography range of a substrate under the substrate to be of lithography, such as on the upper face of the table 20a, and a magnetic shielding material B;20b formed with a hole in a deflecting range of the electron beam between a deflecting electrode 5 and the substrate 7 and mounted with a small gap to the substrate 7.