ELECTRON BEAM DIRECT LITHOGRAPHY EQUIPMENT

PURPOSE:To facilitate proper exposure and realize high quality printed board exposure by a method wherein auxiliary deflection scanning is superposed upon main deflection scanning and, even if the width of a pattern to be lithographed is variously changed, the main deflection scanning speed is contr...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	TOBUSE HIROAKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS PRINTED CIRCUITS SEMICONDUCTOR DEVICES
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