ELECTRON BEAM DIRECT LITHOGRAPHY EQUIPMENT
PURPOSE:To facilitate proper exposure and realize high quality printed board exposure by a method wherein auxiliary deflection scanning is superposed upon main deflection scanning and, even if the width of a pattern to be lithographed is variously changed, the main deflection scanning speed is contr...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE:To facilitate proper exposure and realize high quality printed board exposure by a method wherein auxiliary deflection scanning is superposed upon main deflection scanning and, even if the width of a pattern to be lithographed is variously changed, the main deflection scanning speed is controlled to vary so as to achieve always the most suitable dosage. CONSTITUTION:When lithography is started, the starting point coordinates, length, direction and auxiliary deflection gain information of one line are read out of a lithograph pattern memory 36. The auxiliary deflection gain information is inputted to a clock selecting circuit 30 as a digital value. In accordance with the information, the clock selecting circuit 30 selects a predetermined main deflection scanning control clock in order to maintain the exposure dosage constant for a pattern width to be lithographed, i.e., an auxiliary deflection scanning width and inputs the clock to a vector pattern generating circuit 38. If main deflection scanning clock frequencies which provide the most suitable dosage for the various auxiliary deflection scanning widths are created by a clock frequency dividing circuit 29 beforehand and one of the frequencies selected in accordance with the lithograph data, the suitable exposure can be performed for the lithography of various pattern widths. |
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