PHOTOPOLYMERIZABLE RECORDING MATERIAL, PHOTORESIST LAYER AND LITHOGRAPHIC PLATE MAINLY COMPOSED OF THE SAME AND NEW QUINAZOLON-4 COMPOUND

PURPOSE: To give a sharp contrast in a short exposure time by incorporating a specified compd. whose max. of the long wavelength absorption band is a specified wavelength or below as a sensitizer into photopolymerizable recording material. CONSTITUTION: A compd. represented by the formula is used as...

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Bibliographische Detailangaben
Hauptverfasser:	TOOMASU BURIYUUMERU, ANDOREASU BETOHIYAA, FURIIDORIHI ZAITSU, PEETAA NOIMAN, RAINHARUTO ARUDAKU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY LINING MACHINES MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM PRINTING PRINTING PLATES OR FOILS STAMPS TRANSPORTING TYPEWRITERS
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