PHOTOPOLYMERIZABLE RECORDING MATERIAL, PHOTORESIST LAYER AND LITHOGRAPHIC PLATE MAINLY COMPOSED OF THE SAME AND NEW QUINAZOLON-4 COMPOUND

PURPOSE: To give a sharp contrast in a short exposure time by incorporating a specified compd. whose max. of the long wavelength absorption band is a specified wavelength or below as a sensitizer into photopolymerizable recording material. CONSTITUTION: A compd. represented by the formula is used as...

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Hauptverfasser: TOOMASU BURIYUUMERU, ANDOREASU BETOHIYAA, FURIIDORIHI ZAITSU, PEETAA NOIMAN, RAINHARUTO ARUDAKU
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE: To give a sharp contrast in a short exposure time by incorporating a specified compd. whose max. of the long wavelength absorption band is a specified wavelength or below as a sensitizer into photopolymerizable recording material. CONSTITUTION: A compd. represented by the formula is used as a sensitizer in a photopolymerizable recording material contg. at least one kind of photopolymerizable olefinic unsatd. org. compd., etc. In the formula, R is 1-12C alkyl, cycloalkyl, etc., R is 1-12C alkyl, cycloalkyl, phene-1-6C alkyl, etc., and R is H, 1-12C alkoxy, OH, etc. The max. of the long wavelength absorption band of the compd. represented by the formula is