ALIGNMENT IN ELECTRON BEAM EXPOSURE

PURPOSE:To enable a specimen to be written with high precision and in high throughput while correcting the beam deflection by detecting the height fluctuation of the specimen without using my optical measuring instruments by a method wherein the beam deflection correcting coefficient of imaginary deflectable regions is calculated at one mark position while the beam deflection correcting coefficient regarding the height fluctuation is calculated at the remaining mark positions. CONSTITUTION:An imaginary beam deflectable region 38 with a mark A centered on a beam deflectable region is formed on a position of the mark A for alignment, the mark A is successively stage-shifted (a) to the positions corresponding to the four corners of the region 38, and the beam deflection correcting coefficient of the region 38 is calculated by detecting the mark A by beam deflection from the center of the region 38. Then, the mark A is stage- shifted to the remaining mark positions B-D to calculate the beam deflection correcting coefficient regarding the height fluctuation as well as the relative height relation of the remaining mark positions from the correction coefficient and said imaginary beam deflection correcting coefficient so that the beam deflection correcting coefficient of the region 38 may be corrected corresponding to the relative height relation and the central height of respective beam deflectable regions to calculate the beam deflection correcting coefficient of respective beam deflectable regions.