SPUTTERING DEVICE

PURPOSE:To deposit a material having uniform composition by means of sputtering by providing plural targets mutually forming angles of inclination, respectively, with a substrate and other targets. CONSTITUTION:Plural targets are provided to the inside of a vacuum tank so that they mutually form ang...

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Bibliographische Detailangaben
1. Verfasser:	FUNADA SHIN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INDUCTANCES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAGNETS METALLURGY SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSFORMERS
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Beschreibung
Zusammenfassung:	PURPOSE:To deposit a material having uniform composition by means of sputtering by providing plural targets mutually forming angles of inclination, respectively, with a substrate and other targets. CONSTITUTION:Plural targets are provided to the inside of a vacuum tank so that they mutually form angles of inclination, respectively, with a substrate and other targets. It is desirable to use, as the targets, alloy ingots prepared by melting the elements constituting the targets and the casting the resulting molten alloy. Further, it is also desirable that every target has a composition consisting of one or more kinds among heavy rare-earth metals (HRE), one or more kinds among light rare-earth metals (LRE), and one or more kinds among transition metals (TM) so that (HRE1-xLREx)yTM1-y is satisfied, where the symbols (x) and (y) stand for >0-0.1-