JP2848041B

PURPOSE:To provide a low cost treatment method of a copper plating waste water containing Rochelle salt. CONSTITUTION:Hydrogen peroxide 11 and the ferrous sulfate 12 are added into the copper plating waste water containing Rochelle salt to Fenton oxidize Rochelle salt and after copper is flocculated...

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Hauptverfasser: SABURI OSAMU, SASAKI TAKASHI
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To provide a low cost treatment method of a copper plating waste water containing Rochelle salt. CONSTITUTION:Hydrogen peroxide 11 and the ferrous sulfate 12 are added into the copper plating waste water containing Rochelle salt to Fenton oxidize Rochelle salt and after copper is flocculated and precipitated in the sedimentation basin, the water to be treated is biological treated in the biological treatment vessel 8. In the result, the waste water is treated drastically low in operation cost which is about one-half compared with the conventional method.