JP2764394B

PURPOSE:To attain the high speed access to a designated address by applying deflection scanning to the recording/reproducing/erasing electron beams while the position of a tracking electron beam on a recording medium is being confirmed. CONSTITUTION:With a tracking beam spot TEBS having a relation with reference patterns PL, PR as shown in figure, in comparing currents flowing to the reference patterns PL, PR respectively, a larger current flows to the reference pattern PL having more quantity of radiation of an electron beam. Thus, a voltage is impressed to the tracking electron beam TEB in the polarity positive in a deflection electrode TCR and negative in a deflection electrode TCL to deflect the beam TEB toward the deflection electrode TCR, thereby moving the beam spot TEBS from the reference pattern PL to the pattern PR. In this case, plural electron beams MEB for recording/erasure/reproduction of information and an address data detection electron beam AEB are deflected by the effect of the same electric field as that for the tracking electron beam TEB. Then the beam spot TEBS is controlled so as to be placed at the midpoint between the reference patterns PL, PR.