JP2657695B

PURPOSE:To obtain an amorphous tantalum pentoxide-based insulating film having >=8.0muc/cm performance index over a wide area by coating a substrate with a tantalum alkoxide-contg. sol adjusted to a specified concn. by hydrolysis, heat-treating the coated substrate and repeating the coating and h...

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Bibliographische Detailangaben
Hauptverfasser: OKAMOTO SAYURI, TAKAHASHI KEN, OOISHI TOMOJI, NAKAZAWA TETSUO
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To obtain an amorphous tantalum pentoxide-based insulating film having >=8.0muc/cm performance index over a wide area by coating a substrate with a tantalum alkoxide-contg. sol adjusted to a specified concn. by hydrolysis, heat-treating the coated substrate and repeating the coating and heat treating stages. CONSTITUTION:A sol contg. prescribed amts. of tantalum alkoxide, water and hydrochloric acid is prepd. by partially hydrolyzing tantalum alkoxide used as starting material. A substrate 3 with a vapor-deposited electrically conductive transparent film 2 is spin-coated with the sol and heat-treated at a prescribed temp. and these coating and heat treating stages are repeated by prescribed times. An amorphous transparent dense film 1 having >=8.0muc/cm performance index is produced as an insulating film. Since a large-sized vacuum device is not required, the film is easily obtd. over a large area.