JP2587658B

PURPOSE:To prepare a phosphor which is excellent in the brightness and has a long service life, by treating a phosphor with a plasma in a fluorine compd. CONSTITUTION:A phosphor (A) comprising a sulfide phosphor particle for a dispersive EL device (e.g., a particle mainly composed of zinc sulfide) i...

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Bibliographische Detailangaben
Hauptverfasser:	HIRATE TAKASHI, SAITO MOTOYASU
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL DYES ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NATURAL RESINS NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PAINTS POLISHES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PURPOSE:To prepare a phosphor which is excellent in the brightness and has a long service life, by treating a phosphor with a plasma in a fluorine compd. CONSTITUTION:A phosphor (A) comprising a sulfide phosphor particle for a dispersive EL device (e.g., a particle mainly composed of zinc sulfide) is treated with a plasma in a gas (B) containing 1mol% or more fluorine compd. (e.g., SF6) and optionally an inert gas for 1 to 500 min under conditions of a gas pressure of 0.01-20 Torr, a voltage of 300-10000 V, and a component (A) temp. of room temp-500 deg.C. Thereafter, the treated phosphor is optionally coated with a thin passivation film, and further optionally heat treated at 200-800 deg.C, pref. 300-500 deg.C.