SURFACE TREATMENT UNIT

To provide a surface treatment unit for performing treatment involving charged particle generation means while continuously transposing a base material, capable of effective treatment while suppressing a total amount of charged particles leaked from a processing space.SOLUTION: A surface treatment u...

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Bibliographische Detailangaben
Hauptverfasser:	KAWASHITA MAMORU, TONAI SHUNPEI, KANASUGI KAZUYA
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To provide a surface treatment unit for performing treatment involving charged particle generation means while continuously transposing a base material, capable of effective treatment while suppressing a total amount of charged particles leaked from a processing space.SOLUTION: A surface treatment unit for applying treatment to a surface of a base material to be transported, comprises a housing arranged to leave a certain space between the housing and the base material and having an opening on at least a side of the housing facing the base material, charged particle generating means disposed within the housing, for emitting the charged particles, and magnetic-force generating means located near the edge of the opening, for generating a magnetic field between the housing and the base material.SELECTED DRAWING: Figure 1 【課題】基材を連続的に搬送しながら荷電粒子発生手段を用いた処理を行う表面処理装置において、処理空間から漏出する荷電粒子の総量を抑制しつつ、効果的な処理が可能な表面処理装置を提供する。【解決手段】搬送される基材の表面に処理を施す本発明の表面処理装置は、基材と間をあけるように配置され、少なくとも基材に対向する側が開口している筐体と、上記筐体内に配置され、荷電粒子を放出する荷電粒子発生手段と、上記開口の縁の近傍に配置され、基材との間に磁場を発生させる磁力発生手段と、を有している。【選択図】図１