CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND RESIST PATTERN PRODUCTION METHOD

To produce a resist pattern with good line edge roughness (LER).SOLUTION: A carboxylic acid generator contains a carboxylate represented by formula (I).SELECTED DRAWING: None 【課題】ラインエッジラフネス（ＬＥＲ）が良好なレジストパターンを製造する。【解決手段】式（Ｉ）で表されるカルボン酸塩を含有するカルボン酸発生剤。JPEG2024114657000188.jpg20170【選択図】なし...

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Bibliographische Detailangaben
Hauptverfasser:	ADACHI YUKAKO, ICHIKAWA KOJI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS STEROIDS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	To produce a resist pattern with good line edge roughness (LER).SOLUTION: A carboxylic acid generator contains a carboxylate represented by formula (I).SELECTED DRAWING: None 【課題】ラインエッジラフネス（ＬＥＲ）が良好なレジストパターンを製造する。【解決手段】式（Ｉ）で表されるカルボン酸塩を含有するカルボン酸発生剤。JPEG2024114657000188.jpg20170【選択図】なし