SALT, ACID GENERATOR, RESIST COMPOSITION, AND RESIST PATTERN PRODUCTION METHOD

To produce a resist pattern with good CD uniformity (CDU).SOLUTION: An acid generator contains a salt represented by formula (I).SELECTED DRAWING: None 【課題】良好なＣＤ均一性（ＣＤＵ）でレジストパターンを製造する。【解決手段】式（Ｉ）で表される塩を含有する酸発生剤。JPEG2024114654000187.jpg25170【選択図】なし...

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Bibliographische Detailangaben
Hauptverfasser:	ADACHI YUKAKO, ICHIKAWA KOJI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS STEROIDS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	To produce a resist pattern with good CD uniformity (CDU).SOLUTION: An acid generator contains a salt represented by formula (I).SELECTED DRAWING: None 【課題】良好なＣＤ均一性（ＣＤＵ）でレジストパターンを製造する。【解決手段】式（Ｉ）で表される塩を含有する酸発生剤。JPEG2024114654000187.jpg25170【選択図】なし