PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM AND CURED PRODUCT, METHOD FOR PRODUCING LAMINATED MEMBER, AND METHOD FOR PRODUCING ELECTRONIC PART

To provide a photosensitive composition with enhanced pattern formation and low-stress performance, and a photosensitive film and a cured product, a patterned member and a method for producing an electronic part, each employing the photosensitive composition.SOLUTION: A photosensitive composition in...

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Hauptverfasser:	MURAKAMI YUTA, HAMANO TSUBASA, TAKIGUCHI AYUMI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Zusammenfassung:	To provide a photosensitive composition with enhanced pattern formation and low-stress performance, and a photosensitive film and a cured product, a patterned member and a method for producing an electronic part, each employing the photosensitive composition.SOLUTION: A photosensitive composition includes (a) an acrylic polymer, (b) a photocationic polymerizable compound, (c) a photocationic initiator, (d) a thermal radical polymerizable compound, and (e) a thermal radical initiator.SELECTED DRAWING: None 【課題】パターン形成性、低応力性に優れた感光性組成物、これを用いた感光性フィルム及び硬化物、パターン付部材及び電子部品の製造方法を提供すること。【解決手段】（ａ）アクリルポリマー、（ｂ）光カチオン重合性化合物、（ｃ）光カチオン開始剤、（ｄ）熱ラジカル重合性化合物、及び（ｅ）熱ラジカル開始剤を含む、感光性組成物。【選択図】なし