PHOTOSENSITIVE TRANSFER MATERIAL, RESIN PATTERN PRODUCTION METHOD, CIRCUIT WIRING PRODUCTION METHOD, TOUCH PANEL PRODUCTION METHOD, AND POLYETHYLENE TEREPHTHALATE FILM

To provide a photosensitive transfer material that enables the production of a resin pattern with reduced defects, a resin pattern production method, a circuit wiring production method, and a touch panel production method which use the photosensitive transfer material, and a polyethylene terephthala...

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Bibliographische Detailangaben
Hauptverfasser:	MOROZUMI KAZUMA, FUJIMOTO SHINJI, ARITOMI TAKASHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TRANSPORTING
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Beschreibung
Zusammenfassung:	To provide a photosensitive transfer material that enables the production of a resin pattern with reduced defects, a resin pattern production method, a circuit wiring production method, and a touch panel production method which use the photosensitive transfer material, and a polyethylene terephthalate film.SOLUTION: Provided are: a photosensitive transfer material comprising a temporary support and a photosensitive resin layer disposed on the temporary support, wherein the number of foreign substances with a long diameter of 3 μm or longer included in the temporary support is at most 0.5/mm2; and applications for the photosensitive transfer material.SELECTED DRAWING: None 【課題】欠陥が低減された樹脂パターンを製造できる感光性転写材料、上記感光性転写材料を用いた樹脂パターンの製造方法、回路配線の製造方法及びタッチパネルの製造方法、並びに、ポリエチレンテレフタレートフィルムを提供する。【解決手段】仮支持体と、仮支持体上に配置された感光性樹脂層とを備え、仮支持体に含まれる長径３μｍ以上の異物の個数が０．５個／ｍｍ２以下である、感光性転写材料及びその応用。【選択図】なし