SEMICONDUCTOR PACKAGE AND MANUFACTURING METHOD THEREOF
To provide a semiconductor package capable of improving electric power and performance and reducing a size thereof, and a manufacturing method thereof.SOLUTION: A semiconductor package 10 includes a first chip 100, and a second chip 200 bonded to a front surface the first chip and electrically conne...
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Sprache: | eng ; jpn |
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Zusammenfassung: | To provide a semiconductor package capable of improving electric power and performance and reducing a size thereof, and a manufacturing method thereof.SOLUTION: A semiconductor package 10 includes a first chip 100, and a second chip 200 bonded to a front surface the first chip and electrically connected to the first chip. The first chip includes: a first semiconductor substrate 110 including a first through via 150 (through via 150a for a first signal and through via 150b for first electric power); a first semiconductor element part LS located on a front surface 101 side of the first semiconductor substrate; and a back side wiring layer 130 located on a rear surface of the first semiconductor substrate and electrically connected to the semiconductor element unit. The second chip includes a second semiconductor substrate 210 including a second through via 250 having a greater size than the first through via, and a second semiconductor element part SD.SELECTED DRAWING: Figure 2
【課題】電力及び性能を向上させ、大きさを低減する半導体パッケージ及びその製造方法を提供する。【解決手段】本発明の半導体パッケージ10は、第1チップ100と、第1チップの前面に接合されて第1チップに電気的に連結される第2チップ200と、を備える。第1チップは、第1貫通ビア150(第1信号用貫通ビア150a、第1電力用貫通ビア150b)が備えられた第1半導体基板110と、第1半導体基板の前面101側に位置する第1半導体素子部LSと、第1半導体基板の後面に位置して半導体素子部に電気的に連結される後面電力配線を含む後面配線層130と、を含み、第2チップは、第1貫通ビアよりも大きいサイズを有する第2貫通ビア250が備えられた第2半導体基板210と、第2半導体素子部SDを含む。【選択図】図2 |
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