SEMICONDUCTOR DEVICE

To provide a technique capable of suppressing peeling of a sealing resin that seals a semiconductor element by a simple method.SOLUTION: A semiconductor device 100 includes an insulating substrate 1 having a surface metal pattern 1b on its surface, a semiconductor element 2 mounted on the surface me...

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Bibliographische Detailangaben
Hauptverfasser: KAWAHARA FUMIHITO, SAKAI NORIKAZU
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To provide a technique capable of suppressing peeling of a sealing resin that seals a semiconductor element by a simple method.SOLUTION: A semiconductor device 100 includes an insulating substrate 1 having a surface metal pattern 1b on its surface, a semiconductor element 2 mounted on the surface metal pattern 1b, a wiring wire 4 connected to the surface electrode of the semiconductor element 2, an encapsulation resin 6 that encapsulates the insulating substrate 1 and the semiconductor element 2, and a metal wire 5 arranged along the surface metal pattern 1b around the semiconductor element 2, and the distance between the semiconductor element 2 and the metal wire 5 is greater than the thickness of the semiconductor element 2.SELECTED DRAWING: Figure 1 【課題】簡単な方法で、半導体素子を封止する封止樹脂の剥離を抑制可能な技術を提供することを目的とする。【解決手段】半導体装置100は、表面に表面金属パターン1bが設けられた絶縁基板1と、表面金属パターン1b上に搭載された半導体素子2と、半導体素子2の表面電極と接続された配線ワイヤ4と、絶縁基板1および半導体素子2を封止する封止樹脂6と、半導体素子2の周囲に表面金属パターン1b上に沿って配置された金属ワイヤ5とを備えている。半導体素子2と金属ワイヤ5間の距離は、半導体素子2の厚みよりも大きい。【選択図】図1