INSPECTION DEVICE
To provide an inspection device which can suppress drop of an inspection accuracy caused by disturbance when a wafer is inspected for the appearance by using a three-dimensional measuring machine.SOLUTION: The inspection device includes: a measurement unit having a measurement room surrounded by a b...
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| Format: | Patent |
| Sprache: | eng ; jpn |
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| Zusammenfassung: | To provide an inspection device which can suppress drop of an inspection accuracy caused by disturbance when a wafer is inspected for the appearance by using a three-dimensional measuring machine.SOLUTION: The inspection device includes: a measurement unit having a measurement room surrounded by a barrier wall to separate the air environment in the inside and the air environment in the outside from each other; and a three-dimensional shape measuring machine removably provided in a first opening of the barrier wall of the measurement unit, the three-dimensional shape measuring machine contactlessly measuring the three-dimensional shape of an inspection target object of a wafer in the measurement room.SELECTED DRAWING: Figure 1
【課題】 ３次元形状測定機を用いてウェーハの外観検査を行う場合に、外乱に起因する検査精度の低下を抑制することが可能な検査装置を提供する。【解決手段】 検査装置は、内外の空気環境を分離するための隔壁で囲まれた測定室を有する測定ユニットと、測定ユニットの隔壁に設けられた第１の開口に着脱可能な３次元形状測定機であって、測定室内のウェーハの検査対象物の３次元形状を非接触で測定する３次元形状測定機とを備える。【選択図】 図１ |
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