PLASMA PROCESSING APPARATUS

To provide a plasma device which can perform stably reduction treatment being a simple dry process without requiring a gasification of a complex liquid raw material, or etching treatment, and does not has means of gasificating the liquid raw material.SOLUTION: A plasma device configured to perform r...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NOBORIO KAZUYUKI, TAGUCHI KOJI, YAMAHARA MOTOHIRO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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