SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

To prevent or suppress destruction of a pattern on a substrate front surface at the time of supercritical dryness processing.SOLUTION: A substrate processing apparatus comprises: a liquid processing part that supplies processing liquid from a nozzle to a substrate, and forms a liquid film of the pro...

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Bibliographische Detailangaben
1. Verfasser:	GOSHI GENTARO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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