SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

To prevent or suppress destruction of a pattern on a substrate front surface at the time of supercritical dryness processing.SOLUTION: A substrate processing apparatus comprises: a liquid processing part that supplies processing liquid from a nozzle to a substrate, and forms a liquid film of the processing liquid onto a front surface of a substrate as a pre-step of supercritical dryness processing; a buffer tank that accumulates the processing liquid supplied from a processing liquid supply source; a supply pipe that connects the processing liquid supply source, the buffer tank, and a nozzle, and allows the processing liquid to pass therethrough toward the nozzle from the processing liquid supply source; a processing liquid supply part including a supply control part that performs the processing liquid supply to the nozzle and a supply stop; a dissolved oxygen concentration measurement part that is provided on the supply pipe or a branch distribution that is branched from the supply pipe, and measures a dissolved oxygen concentration in the processing liquid in the supply pipe or processing liquid fetched from the supplying pipe via the branch pipe; and a control part that determines the supply of the processing liquid to the substrate from the nozzle on the basis of a measurement result of the dissolved oxygen concentration part, and controls the supply control part on the basis of the determination result.SELECTED DRAWING: Figure 11 【課題】超臨界乾燥処理時における基板表面のパターンの倒壊の防止又は抑制【解決手段】基板処理装置は、ノズルから基板に処理液を供給し、超臨界乾燥処理の前工程として処理液の液膜を基板の表面に形成する液処理部と、処理液供給源から供給された処理液を貯留するバッファタンクと、処理液供給源、バッファタンク及びノズルを接続し、処理液供給源からノズルに向けて処理液を通過させる供給配管と、ノズルへの処理液供給、供給停止を行う供給制御部とを有する処理液供給部と、供給配管に設けられるか、あるいは供給配管から分岐する分岐配管に設けられ、供給配管内にある処理液又は供給配管から分岐配管を介して取り出された処理液中の溶存酸素濃度を測定する溶存酸素濃度測定部と、溶存酸素濃度測定部の測定結果に基づいてノズルから基板への処理液の供給可否を判断し、その判断結果に基づいて供給制御部を制御する制御部とを備える。【選択図】図１１