MEASUREMENT CHIP, MEASURING DEVICE, AND MEASUREMENT METHOD
To provide an optical-waveguide-type measurement chip, a measuring device, and a measurement method that further increases reproducibility of measurement and reliability of measurement and further reduces costs of a manufacturing process.SOLUTION: A measurement chip 1 includes a propagation layer 2...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng ; jpn |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | To provide an optical-waveguide-type measurement chip, a measuring device, and a measurement method that further increases reproducibility of measurement and reliability of measurement and further reduces costs of a manufacturing process.SOLUTION: A measurement chip 1 includes a propagation layer 2 propagating light in a propagation direction Y, an introduction unit 3 introducing light to the propagation layer 2, a derivation unit 4 deriving light from the propagation layer 2, and a coating layer 5 in which coating is formed on the surface of the propagation layer 2, and length in the propagation direction Y in a formation area of coating increases or decreases along a vertical direction X relative to the propagation direction Y, and a ligand 6 reacting with an analyte in a measurement object can be decorated on a surface 2A of the propagation layer 2 of an exposed area that is exposed at least from the coating layer 5.SELECTED DRAWING: Figure 1
【課題】測定の再現性や測定の信頼性をさらに向上させ、作製プロセスをさらに低コスト化した光導波路型の測定用チップ、測定装置、および測定方法を提供する。【解決手段】測定用チップ1は、光が伝搬方向Yに伝搬する伝搬層2と、伝搬層2に光を導入する導入部3と、伝搬層2から光を導出する導出部4と、伝搬層2の表面上にコーティングが形成され、コーティングの形成領域における伝搬方向Yの長さが、伝搬方向Yに対する垂直方向Xに沿って増加または減少するコーティング層5と、を備え、少なくともコーティング層5から露出する露出領域の伝搬層2の表面2Aに、測定対象物中のアナライトに反応するリガンド6を修飾可能である。【選択図】図1 |
---|