CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

To produce a resist pattern with good CD uniformity (CDU).SOLUTION: A carboxylic acid generator contains a carboxylate represented by formula (I).SELECTED DRAWING: None 【課題】良好なＣＤ均一性（ＣＤＵ）でレジストパターンを製造する。【解決手段】式（Ｉ）で表されるカルボン酸塩を含有するカルボン酸発生剤。JPEG2024080673000171.jpg20170【選択図】なし...

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Hauptverfasser:	ADACHI YUKAKO, ICHIKAWA KOJI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON DYES ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	To produce a resist pattern with good CD uniformity (CDU).SOLUTION: A carboxylic acid generator contains a carboxylate represented by formula (I).SELECTED DRAWING: None 【課題】良好なＣＤ均一性（ＣＤＵ）でレジストパターンを製造する。【解決手段】式（Ｉ）で表されるカルボン酸塩を含有するカルボン酸発生剤。JPEG2024080673000171.jpg20170【選択図】なし