PROCESSING METHOD

To provide a method capable of fine processing on a workpiece.SOLUTION: A workpiece W to be processed is prepared (S100), and a metal thin film 10 is formed on a surface of the workpiece W as preprocessing (S110). The workpiece W formed with the metal thin film 10 is irradiated with a pulse laser be...

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Bibliographische Detailangaben
Hauptverfasser: YAMAUCHI KAORU, MIMURA HIDEKAZU, ANZAI TETSUHISA, MOTOYAMA HIROTO, IWASAKI JUNJI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a method capable of fine processing on a workpiece.SOLUTION: A workpiece W to be processed is prepared (S100), and a metal thin film 10 is formed on a surface of the workpiece W as preprocessing (S110). The workpiece W formed with the metal thin film 10 is irradiated with a pulse laser beam 20 from a side of the metal thin film 10 (S120), and processing is performed on the workpiece W (S130). Then, the metal thin film 10 is removed as post processing (S140).SELECTED DRAWING: Figure 1 【課題】ワークを微細加工することが可能な方法を提供する。【解決手段】加工対象のワークWを準備し(S100)、前処理としてその表面に金属薄膜10を形成する(S110)。続いて、金属薄膜10が形成されたワークWに、金属薄膜10側からパルスレーザー光20を照射し(S120)、ワークWを加工する(S130)。そして後処理として、金属薄膜10を除去する(S140)。【選択図】図1