HEAT TREATMENT METHOD, PROGRAM AND HEAT TREATMENT APPARATUS

To provide a technique for accelerating the change in solubility in heat treatment of a substrate on whose surface is formed an exposed resist whose solubility in the developing solution of the exposed or unexposed portions changes when heated in reaction with water.SOLUTION: It has a stage in which...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ONITSUKA TOMOYA, KAWAKAMI SHINICHIRO, SANO YOHEI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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