ATOMIZATION DEVICE
To provide an atomization device which performs primary atomization which utilizes collision energy of a jetted material at a maximum and secondary atomization in which the material is ground in a gap between a sphere and a sphere holder.SOLUTION: An atomization device includes: a jet chamber 5 in w...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | To provide an atomization device which performs primary atomization which utilizes collision energy of a jetted material at a maximum and secondary atomization in which the material is ground in a gap between a sphere and a sphere holder.SOLUTION: An atomization device includes: a jet chamber 5 in which a material M is processed and which has a front chamber holder 10 disposed at the material M introduction side and a rear chamber holder 11 disposed at the material M discharge side; a sphere 14 with which the material M collides; and nozzle holders 15, 16 which are disposed in the jet chamber 5, house the sphere 14, and include a protection holder 15 disposed at the material M introduction side and a sphere holder 16 disposed at the material M discharge side.SELECTED DRAWING: Figure 1
【課題】噴射される原料の衝突エネルギーを最大限に利用する一次的な微粒化と、球体と球体ホルダの隙間で原料をすり潰す二次的な微粒化を行う微粒化装置を提供する。【解決手段】微粒化装置は、原料Mを処理する噴射チャンバー5であって、原料Mの導入側に配置される前側チャンバーホルダ10と、原料Mの排出側に配置される後側チャンバーホルダ11と、を有する噴射チャンバー5と、原料Mを衝突させる球体14と、噴射チャンバー5内に配置され、球体14を収容するノズルホルダ15、16であって、原料Mの導入側に配置される保護ホルダ15と、原料Mの排出側に配置される球体ホルダ16と、を有するノズルホルダ15、16と、を有する。【選択図】図1 |
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