SUBSURFACE SCATTERING ANALYSIS DEVICE, SUBSURFACE SCATTERING ANALYSIS SYSTEM AND SUBSURFACE SCATTERING ANALYSIS PROGRAM

To make it possible to measure a state of subsurface scattering in line with an illumination condition of a subject in a three-dimensional model acquired by a volumetric capture technology.SOLUTION: A subsurface scattering analysis device 1 comprises: a subject shape acquisition unit 130 that acquir...

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1. Verfasser: MITSUMINE HIDEKI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To make it possible to measure a state of subsurface scattering in line with an illumination condition of a subject in a three-dimensional model acquired by a volumetric capture technology.SOLUTION: A subsurface scattering analysis device 1 comprises: a subject shape acquisition unit 130 that acquires a subject shape and surface pattern; a surface reflection characteristic measurement unit 140 that acquires information about a subject surface reflection as surface reflection characteristic information; a subsurface scattering analysis unit 150 that uses a dot pattern projection device 50 to irradiate the subject with dot pattern light, and calculates subsurface scattering state information, using a diffuse reflection component of light intensity in a luminance distribution to be indicated by an image of reflection light of the subject of the dot pattern light a polarization imaging device 40 captures; and a three-dimensional model information integration unit 160 that outputs calculated information as three-dimensional model detail information.SELECTED DRAWING: Figure 1 【課題】ボリュメトリックキャプチャ技術で取得した3次元モデルにおいて、被写体の照明条件に合わせた表面下散乱の状態を計測可能とする。【解決手段】表面下散乱分析装置1は、被写体形状および表面模様を取得する被写体形状取得部130と、被写体表面反射に関する情報を表面反射特性情報として取得する表面反射特性計測部140と、ドットパターン投影装置50を用いてドットパターン光を被写体に照射させ、偏光撮影装置40が撮影したドットパターン光の被写体の反射光の画像で示される輝度分布における光強度の拡散反射成分を用いて、表面下散乱状態情報を算出する表面下散乱分析部150と、算出した情報を3次元モデル詳細情報として出力する3次元モデル情報統合部160とを備える。【選択図】図1