ANALYSIS SYSTEM, EXPOSURE APPARATUS, AND DEVICE

To improve through-put.SOLUTION: An analysis system comprises: an acquisition part which acquires first information which is pattern information of a first pattern exposed and measured on a first substrate and second information which is pattern information of a second pattern exposed and measured o...

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Bibliographische Detailangaben
Hauptverfasser:	SAWAOKA YOSUKE, MIYAZAKI SEIJI, HIGUCHI KIYOSHI, KIMURA MICHIHIRO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	To improve through-put.SOLUTION: An analysis system comprises: an acquisition part which acquires first information which is pattern information of a first pattern exposed and measured on a first substrate and second information which is pattern information of a second pattern exposed and measured on the first pattern; a first calculation part which calculates first difference information showing a difference between the first information and the second information acquired by the acquisition part; a storage part which stores the first difference information; and a second calculation part which calculates a predetermined parameter on the basis of the first difference information stored in the storage part.SELECTED DRAWING: Figure 29 【課題】スループットを向上する。【解決手段】解析システムは、第１基板上に露光され測定された第１パターンのパターン情報である第１情報と、前記第１パターン上に露光され測定された第２パターンのパターン情報である第２情報を取得する取得部と、前記取得部で取得された前記第１情報と前記第２情報との差分を示す第１差分情報を算出する第１算出部と、前記第１差分情報を記憶する記憶部と、前記記憶部で記憶された前記第１差分情報に基づいて、所定のパラメータを算出する第２算出部と、を備える。【選択図】図２９