COMPOSITION AND PHOTOSENSITIVE COMPOSITION

To provide a photosensitive composition which, even when heated, is less prone to excessive reduction in the mass of a composition, or components in the photosensitive composition (where the components exclude any solvent if the composition or the photosensitive composition contains the solvent), an...

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1. Verfasser: SUGAWARA RYUTARO
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To provide a photosensitive composition which, even when heated, is less prone to excessive reduction in the mass of a composition, or components in the photosensitive composition (where the components exclude any solvent if the composition or the photosensitive composition contains the solvent), and allows inorganic particles to be stably dispersed over a long period, and to provide a cured product of the photosensitive composition, a compound suitably blended in the photosensitive composition, and a method for producing the compound.SOLUTION: The present invention provides a composition containing a photopolymerizable compound (A) and inorganic fine particles (B), or a photosensitive composition containing a photopolymerizable compound (A), inorganic fine particles (B), and an initiator (C). As the photopolymerizable compound (A), used is a compound of a specific structure with a radical-polymerizable group-containing group or a cationic polymerizable group-containing group.SELECTED DRAWING: None 【課題】加熱されても組成物、又は感光性組成物中の成分(組成物又は感光性組成物が溶媒を含む場合は溶媒以外の成分)の質量の過度の減少が生じにくく、無機微粒子が長期間にわたって安定して分散する感光性組成物と、当該感光性組成物の硬化物と、前述の感光性組成物に好ましく配合される化合物と、当該化合物の製造方法とを提供すること。【解決手段】光重合性化合物(A)と、無機微粒子(B)とを含む組成物、又は光重合性化合物(A)と、無機微粒子(B)と、開始剤(C)とを含む感光性組成物において、光重合性化合物(A)として、ラジカル重合性基含有基、又はカチオン重合性基含有基を有する特定の構造の化合物を用いる。【選択図】なし