POLISHING LIQUID COMPOSITION FOR SILICON OXIDE FILM

To provide a polishing liquid composition for a silicon oxide film that can improve both its polishing speed and the in-plane uniformity of the surface of a substrate after polishing.SOLUTION: The polishing liquid composition for a silicon oxide film includes cerium oxide particles (component A), a...

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Bibliographische Detailangaben
Hauptverfasser:	INOUE MASAKI, YAMAGUCHI TETSUSHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SEMICONDUCTOR DEVICES SKI WAXES
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