LAMINATE AND METHOD OF PRODUCING LAMINATE

To provide a laminate excellent in laminate suitability and having suppressed occurence of migration, and a method of producing the laminate.SOLUTION: A laminate comprises a base material and a wiring part in which a transparent wiring layer and a metal wiring layer are laminated in this order on th...

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Hauptverfasser:	MOROZUMI KAZUMA, ARITOMI TAKASHI, KATAYAMA AKIO, SATO MORIMASA
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CABLES CALCULATING CINEMATOGRAPHY COMPUTING CONDUCTORS COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INSULATORS LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES TRANSPORTING
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Beschreibung
Zusammenfassung:	To provide a laminate excellent in laminate suitability and having suppressed occurence of migration, and a method of producing the laminate.SOLUTION: A laminate comprises a base material and a wiring part in which a transparent wiring layer and a metal wiring layer are laminated in this order on the base material, and a width R1 of the metal wiring layer and a width R2 of the transparent wiring layer satisfying the following formula (1), and a method for producing the laminate is also provided. 0.1 μm≤R2-R1≤6.0 μm (1)SELECTED DRAWING: Figure 1 【課題】ラミネート適性に優れ、かつ、マイグレーションの発生が抑制された積層体、及び積層体の製造方法の提供。【解決手段】基材と、上記基材上に透明配線層及び金属配線層がこの順に積層された配線部と、を有する積層体であって、上記金属配線層の幅Ｒ１と上記透明配線層の幅Ｒ２とが、下記の式（１）を満たす積層体、及び、積層体の製造方法。０．１μｍ≦Ｒ２－Ｒ１≦６．０μｍ（１）【選択図】図１