ETCHING LIQUID FOR TIN OXIDE FILM

To provide an etching liquid for tin oxide film capable of solving the problem below; i.e. in an electronic circuit made using the LPD method and plating film, since a tin oxide film is conductive, current leakage may occur between metal parts; thus, the tin oxide film must be removed to prevent dam...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHIRAHAMA YUJI, SENOO SHUNSAKU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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