SUBSTRATE PROCESSING APPARATUS

To provide a substrate processing apparatus.SOLUTION: An apparatus includes: a substrate reaction chamber configured to hold and process a substrate; a remote plasma unit for generating a radical gas to clean the substrate reaction chamber; a cooling unit, the cooling unit comprising a tank configur...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JEONG WONKI, KIM DAEYOUN
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
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