SUBSTRATE PROCESSING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND PROGRAM

To provide a technology that can suppress false detection of the presence or absence of a substrate caused by the light receiving part receiving directly reflected light.SOLUTION: It has a holding section having a holding surface capable of holding a substrate, a light emitting section arranged to irradiate irradiated light toward the back surface of the substrate held on the holding surface, a light detecting section having a light receiving section arranged to receive diffuse reflected light of the irradiated light without receiving normal reflected light of the irradiated light, and a control section configured to be able to determine whether the substrate is present by the light receiving state of the light receiving section.SELECTED DRAWING: Figure 5 【課題】受光部が正反射光を受光することに起因する基板の有無の誤検知を抑制できる技術を提供する。【解決手段】基板を保持可能な保持面を有する保持部と、前記保持面に保持された前記基板の裏面へ向かうように照射光を照射するように配置された発光部と、照射された前記照射光の正反射光は受光せず、前記照射光の拡散反射光を受光可能に配置された受光部と、を備えた光検出部と、前記受光部の受光状態により前記基板の有無を判定することが可能なよう構成される制御部と、を備える。【選択図】図５