SUBSTRATE PROCESSING SYSTEM AND POSITION MEASUREMENT METHOD

To provide a technique for measurement by a measuring instrument, enabling stable detection of a location of a substrate.SOLUTION: A substrate processing system comprises a holder for holding a substrate, a measuring instrument for measuring a relative distance with the substrate, the measuring instrument being provided in a posture facing the substrate held by the holder, a mover for changing a relative position of the measuring instrument and the substrate, and a controller for controlling the mover, the measuring instrument being connected thereto. The measuring instrument detects light reflected on a surface of the substrate with a white confocal method in which a different focal distance is set for each of a plurality of wavelengths. The controller compares a reflected-light receiving quantity with a threshold held in advance, and when the light receiving quantity is less than the threshold, causes the mover to change the relative position and calculates then a position of the substrate using the relative distance measured by the measuring instrument.SELECTED DRAWING: Figure 8 【課題】測定器の計測において基板の位置をより安定的に検出できる技術を提供する。【解決手段】基板処理装置は、基板を保持する保持部と、保持部に保持される基板の対向位置に設けられ、基板との相対距離を計測する測定器と、測定器と基板との相対位置を変位させる移動部と、測定器が接続されると共に、移動部を制御する制御部と、を備える。測定器は、複数の波長毎に異なる焦点距離に設定された白色共焦点方式により基板の表面を反射した反射光を検出する。制御部は、予め保有する閾値と反射光の受光量とを比較し、反射光の受光量が閾値未満の場合に、移動部により相対位置を変位させ、その後に測定器が計測した相対距離を用いて基板の位置を算出する。【選択図】図８