SUBSTRATE PROCESSING DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

To provide a substrate processing device and a method of manufacturing a semiconductor device capable of realizing a high throughput in substrate processing using a plasma.SOLUTION: A plasma processing unit 410 used as a processing chamber has: a reaction container 431; a resonance coil 432 provided...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KAKUDA TORU, SHIMADA TOSHIYA, AMANO TOMIHIRO, NOUCHI HIDEHIRO, HIYAMA MAKOTO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!