VISUAL INSPECTION DEVICE

To provide a visual inspection device that detects a defect in a wafer before a polishing step that has a plurality of recesses and projections on its surface.SOLUTION: A visual inspection device 1 detects a defect in a wafer W before a polishing step that has a plurality of recesses and projections on its surface, and comprises: holding means 131 that holds the wafer; and apex inspection means 114 that inspects an apex part WA of the wafer W. The apex inspection means 114 has: a first surface illumination 117a and a pseudo coaxial epi-illumination 118 that have optical axes orthogonal to a central axis of the wafer W and irradiate the apex part WA with measuring beams; and third imaging means 119 that has an optical axis matching that of the pseudo coaxial epi-illumination 118 and picks up images of the apex part WA and a bevel part WB. The first surface illumination 117a has an opening 117c formed at the center part, and the apex part WA is irradiated with the measuring beam from the pseudo coaxial epi-illumination 118 through the opening 117c.SELECTED DRAWING: Figure 6 【課題】表面に複数の凹凸を有する、ポリッシング工程前のウェーハの欠陥を検出する外観検査装置を提供する。【解決手段】表面に複数の凹凸を有する、ポリッシング工程前のウェーハＷの欠陥を検出する外観検査装置１であって、ウェーハを保持する保持手段１３１と、ウェーハＷのアペックス部ＷＡを検査するアペックス検査手段１１４とを備え、アペックス検査手段１１４が、光軸がウェーハＷの中心軸と直交し、アペックス部ＷＡに測定光を照射する第１の面照明１１７ａ及び疑似同軸落射照明１１８と、光軸が疑似同軸落射照明１１８と一致し、アペックス部ＷＡ及びベベル部ＷＢを撮像する第３の撮像手段１１９とを有するとともに、第１の面照明１１７ａの中央部には開口部１１７ｃが形成され、当該開口部１１７ｃを介して疑似同軸落射照明１１８からの測定光がアペックス部ＷＡに照射される。【選択図】図６