HEAD FOR EJECTING REACTIVE GAS FOR DEPOSITING FILM AND METHOD FOR MANUFACTURING THE SAME

To provide a head that can evenly eject a reactive gas for depositing a film in a film deposition apparatus, and to provide a method for manufacturing the same.SOLUTION: A method for manufacturing a head includes the steps of: diffusion joining a first plate and a second plate to each other; and for...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ARAKI YOSHIHITO, KANEDA NORIYOSHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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