COMPOSITION FOR SEMICONDUCTOR PHOTORESIST AND PATTERNING METHOD USING THE SAME

To provide a composition for semiconductor photoresist that can achieve a pattern with markedly improved sensitivity, resolution, and storage stability, and a patterning method using the same.SOLUTION: A composition for semiconductor photoresist includes a first organometallic compound represented b...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KANG EUNMI, LIM SOOBIN, CHAE SEUNGYONG, WOO CHANG SOO, LEE MINYOUNG, SEO YAEUN, MOON KYUNG SOO, KIM JIMIN, JANG SUMIN, IM SANG KYUN, HAN SEUNG
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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