COMPOSITION FOR SEMICONDUCTOR PHOTORESIST AND PATTERNING METHOD USING THE SAME

To provide a composition for semiconductor photoresist that can achieve a pattern with markedly improved sensitivity, resolution, and storage stability, and a patterning method using the same.SOLUTION: A composition for semiconductor photoresist includes a first organometallic compound represented b...

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Hauptverfasser:	KANG EUNMI, LIM SOOBIN, CHAE SEUNGYONG, WOO CHANG SOO, LEE MINYOUNG, SEO YAEUN, MOON KYUNG SOO, KIM JIMIN, JANG SUMIN, IM SANG KYUN, HAN SEUNG
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Zusammenfassung:	To provide a composition for semiconductor photoresist that can achieve a pattern with markedly improved sensitivity, resolution, and storage stability, and a patterning method using the same.SOLUTION: A composition for semiconductor photoresist includes a first organometallic compound represented by formula 1, a second organometallic compound represented by formula 2 (excluding the first organometallic compound), and a solvent.SELECTED DRAWING: Figure 5 【課題】感度、解像度、および保管安定性の顕著に向上したパターンを実現することができる半導体フォトレジスト用組成物およびこれを用いたパターン形成方法を提供する。【解決手段】化学式１で表される第１有機金属化合物、化学式２で表される第２有機金属化合物（ただし、前記第１有機金属化合物を除く）、および溶媒を含む、半導体フォトレジスト用組成物。【選択図】図５