FOCUS RING AND PLASMA ETCHING APPARATUS INCLUDING THE SAME

To provide a focus ring which is more stably fixed to a component of a plasma etching apparatus, satisfies uniform etching of an object to be etched, and satisfies good electrostatic attraction with an electrostatic chuck of the plasma etching apparatus, and to provide the plasma etching apparatus including the focus ring.SOLUTION: A focus ring, which is arranged in a plasma etching apparatus so that an etching target is mounted, includes: a seating portion 110 including a seating surface 111 in which the etching target is mounted; and a main body portion 120 formed on an outer circumference of the seating portion 110. The main body portion 120 comprises a groove portion 130 having a groove 132 formed in at least a part of an upper surface of the main body portion. The groove portion 130 has an average thickness tg thinner than an average thickness tb of the main body portion 120.SELECTED DRAWING: Figure 3 【課題】より安定的にプラズマエッチング装置の部品に固定され、エッチング対象の均一なエッチングを満たし、プラズマエッチング装置の静電チャックと良好な静電気的引力を満たすフォーカスリング及びこれを含むプラズマエッチング装置を提供する。【解決手段】エッチング対象が載置されるようにプラズマエッチング装置内に配置されるフォーカスリングであって、エッチング対象が載置される載置面１１１を含む載置部１１０と、載置部１１０の外周に形成された本体部１２０と、を含む。本体部１２０は、上面の少なくとも一部に溝１３２が形成された溝部１３０を含む。溝部１３０は、本体部１２０の平均厚さｔｂよりも薄い平均厚さｔｇを有する。【選択図】図３