INSULATED WIRE AND METHOD FOR MANUFACTURING INSULATED WIRE

To provide an insulated wire that can easily inhibit occurrence of a defect in appearance and decrease in an insulating property, and a method for manufacturing the insulated wire.SOLUTION: The insulated wire comprises: a conductor 20 having an elongated shape; and an insulating coating 30 provided...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: USHIWATA TAKAMI, NISHI HAJIME, HONDA YUKI
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To provide an insulated wire that can easily inhibit occurrence of a defect in appearance and decrease in an insulating property, and a method for manufacturing the insulated wire.SOLUTION: The insulated wire comprises: a conductor 20 having an elongated shape; and an insulating coating 30 provided around the conductor 20, the insulating coating being formed by laminating multiple insulating layers 33 each including pores. If an average value of respective thicknesses of the multiple insulating layers 33 at a thick portion 30MAX of the insulating coating 30 having the largest thickness is defined as a first thickness and an average value of respective thicknesses of the multiple insulating layers 33 at a thin portion 30MIN of the insulating coating 30 having the smallest thickness is defined as a second thickness, then a thickness difference between the first thickness and the second thickness is 0.5 μm or less.SELECTED DRAWING: Figure 10 【課題】外観不具合の発生および絶縁性の低下を抑制しやすい絶縁電線および絶縁電線の製造方法を提供する。【解決手段】長尺状の形状を有する導体20と、導体20の周囲に設けられ、空孔を含む複数の絶縁層33を積層させてなる絶縁被膜30と、が設けられ、絶縁被膜30の最も厚い部分である膜厚部30MAXにおける複数の絶縁層33のそれぞれの膜厚の平均値である第1膜厚と、絶縁被膜30の最も薄い部分である膜薄部30MINにおける複数の絶縁層33のそれぞれの膜厚の平均値である第2膜厚と、の差である膜厚差の値が0.5μm以下である。【選択図】 図10