PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS

To provide photoacid generators, photoresist compositions, and pattern formation methods.SOLUTION: A photoacid generator includes: an organic cation; and an anion including an anionic core, wherein the anionic core includes a cyclopentadienide group, wherein the cyclopentadienide group is substitute...

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Hauptverfasser:	THOMAS MARANGONI, LI MINGQI, JAMES F CAMERON, PAUL LABEAUME, EMAD AQAD
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	To provide photoacid generators, photoresist compositions, and pattern formation methods.SOLUTION: A photoacid generator includes: an organic cation; and an anion including an anionic core, wherein the anionic core includes a cyclopentadienide group, wherein the cyclopentadienide group is substituted with an organic group including a semi-metal element, and wherein the anion is substituted with one or more electron withdrawing groups. 【課題】光酸発生剤、フォトレジスト組成物及びパターン形成方法を提供する。【解決手段】有機カチオンと、シクロペンタジエニド基を含むアニオン性コアを含むアニオンとを含む光酸発生剤であって、シクロペンタジエニド基は、半金属元素を含む有機基で置換されており、アニオンは、１つ又は複数の電子吸引基で置換されている、光酸発生剤。